Plasma conditions for as-grown low temperature poly-Si formation on SiO[sub 2] substrate by sputtering and plasma enhanced chemical vapor deposition processes
Takeya, M.Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581196
Date:
May, 1998
File:
PDF, 552 KB
english, 1998