Effect of fluorine incorporation on silicon dioxide...

Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH[sub 4]∕O[sub 2]∕NF[sub 3] chemistry

Kim, Jae-Hong, Chung, Chai-O, Sheen, Dongsun, Sohn, Yong-Sun, Sohn, Hyun-Chul, Kim, Jin-Woong, Park, Sung-Wook
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Volume:
96
Year:
2004
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1767979
File:
PDF, 405 KB
english, 2004
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