Low-temperature selective-area deposition of metals: Chemical vapor deposition of gold from ethyl(trimethylphosphine)gold(I)
Banaszak Holl, M. M., Seidler, P. F., Kowalczyk, S. P., McFeely, F. R.Volume:
62
Year:
1993
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.108663
File:
PDF, 587 KB
english, 1993