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Mass-analyzed CF[sub x][sup +] (x=1,2,3) ion beam study on selectivity of SiO[sub 2]-to-SiN etching and a-C:F film deposition
Yanai, Ken-ichi, Karahashi, Kazuhiro, Ishikawa, Kenji, Nakamura, MoritakaVolume:
97
Year:
2005
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1854726
File:
PDF, 735 KB
english, 2005