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[IEEE 2008 Symposium on VLSI Technology - Honolulu, HI, USA (2008.06.17-2008.06.19)] 2008 Symposium on VLSI Technology - A new direct low-k/Cu dual damascene (DD) contact lines for low-loss (LL) CMOS device platforms
Kawahara, J., Ueki, M., Tagami, M., Yako, K., Yamamoto, H., Ito, F., Nagase, H., Saito, S., Furutake, N., Onodera, T., Takeuchi, T., Nakamura, H., Arita, K., Motoyama, K., Nakazawa, E., Fujii, K., SekYear:
2008
Language:
english
DOI:
10.1109/vlsit.2008.4588580
File:
PDF, 1.29 MB
english, 2008