Thin-film interactions in Si/SiO2/W-Ti/Al-1% Si system

Journal of Applied Physics 1987 Vol. 62; Iss. 6

Thin-film interactions in Si/SiO2/W-Ti/Al-1% Si system

Chang, Peng-Heng, Liu, Hung-Yu, Keenan, J. A., Anthony, J. M., Bohlman, J. G.
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Volume:
62
Year:
1987
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.339459
File:
PDF, 838 KB
english, 1987
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