Significant improvement of electrical and thermal...

Journal of Applied Physics 2001 Vol. 89; Iss. 2

Significant improvement of electrical and thermal properties of low dielectric constant plasma polymerized paraxylene thin films by postdeposition H[sub 2]+He plasma treatment

Quan, Yong Chun, Yeo, Sanghak, Shim, Cheonman, Yang, Jaeyoung, Jung, Donggeun
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Volume:
89
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1335826
File:
PDF, 283 KB
english, 2001
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