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Mechanical strain and damage in Si implanted with O and N ions at elevated temperatures: Evidence of ion beam induced annealing
de Souza, J. P., Suprun-Belevich, Yu., Boudinov, H., Cima, C. A.Volume:
89
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1330254
File:
PDF, 320 KB
english, 2001