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X-ray photoelectron study of the reactive ion etching of SixGe1−x alloys in SF6 plasmas
Peignon, M. C.Volume:
14
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.579913
Date:
January, 1996
File:
PDF, 468 KB
english, 1996