Wet chemical etching studies of Zr and Hf-silicate gate...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2002 Vol. 20; Iss. 6

Wet chemical etching studies of Zr and Hf-silicate gate dielectrics

Quevedo-Lopez, M. A., El-Bouanani, M., Wallace, R. M., Gnade, B. E.
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Volume:
20
Year:
2002
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1507343
File:
PDF, 387 KB
english, 2002
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