Fabrication of sub-100-nm metal-oxide-semiconductor...

Fabrication of sub-100-nm metal-oxide-semiconductor field-effect transistors with asymmetrical source/drain using I-line double patterning technique

Lin, Horng-Chih, Tsai, Tzu-I, Chao, Tien-Sheng, Jian, Min-Feng, Huang, Tiao-Yuan
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Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3551527
File:
PDF, 1.28 MB
english, 2011
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