Effects of ion bombardment in plasma etching on the...

Effects of ion bombardment in plasma etching on the fluorinated silicon surface layer: Real-time and postplasma surface studies

Oehrlein, Gottlieb S.
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Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.578717
Date:
January, 1993
File:
PDF, 1.35 MB
english, 1993
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