Effects of ion bombardment in plasma etching on the fluorinated silicon surface layer: Real-time and postplasma surface studies
Oehrlein, Gottlieb S.Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.578717
Date:
January, 1993
File:
PDF, 1.35 MB
english, 1993