Redistribution of phosphorus in high-energy ion-implanted...

Redistribution of phosphorus in high-energy ion-implanted silicon

Kato, Juri, Yonenaga, Tomihiro
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Volume:
62
Year:
1987
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.339060
File:
PDF, 402 KB
english, 1987
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