Preparation and Formation Mechanism of Highly Dispersed...

Chemical Vapor Deposition 2013 / 03 Vol. 19; Iss. 1-3

Preparation and Formation Mechanism of Highly Dispersed Manganese Silicide on Silica by MOCVD of Mn(CO) 5 SiCl 3

Guan, Jingchao, Jin, Jianhui, Chen, Xiao, Zhang, Bingsen, Su, Dangsheng, Liang, Changhai
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Volume:
19
Language:
english
Journal:
Chemical Vapor Deposition
DOI:
10.1002/cvde.201207009
Date:
March, 2013
File:
PDF, 312 KB
english, 2013
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