The chemical oxidation of hydrogen-terminated silicon (111) surfaces in water studied in situ with Fourier transform infrared spectroscopy
Boonekamp, E. P., Kelly, J. J., van de Ven, J., Sondag, A. H. M.Volume:
75
Year:
1994
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.356510
File:
PDF, 950 KB
english, 1994