Surface reactions during low-k etching using H[sub 2]∕N[sub...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2008 Vol. 26; Iss. 4

Surface reactions during low-k etching using H[sub 2]∕N[sub 2] plasma

Fukasawa, Masanaga, Tatsumi, Tetsuya, Oshima, Keiji, Nagahata, Kazunori, Uchida, Saburo, Takashima, Seigo, Hori, Masaru, Kamide, Yukihiro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
26
Year:
2008
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2839764
File:
PDF, 825 KB
english, 2008
Conversion to is in progress
Conversion to is failed