Influence of sputtering mechanisms on the preferred...

Influence of sputtering mechanisms on the preferred orientation of aluminum nitride thin films

Clement, M., Iborra, E., Sangrador, J., Sanz-Hervás, A., Vergara, L., Aguilar, M.
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Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1587267
File:
PDF, 306 KB
english, 2003
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