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Two-step dopant diffusion study performed in two dimensions by scanning capacitance microscopy and TSUPREM IV
Kim, J., McMurray, J. S., Williams, C. C., Slinkman, J.Volume:
84
Year:
1998
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.368245
File:
PDF, 319 KB
english, 1998