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Electromigration-induced short-circuit failure in aluminum underlaid with chemically vapor deposited tungsten
Broadbent, Eliot K., Towner, Janet M., Towsend, Paul H., Vander Plas, Hubert A.Volume:
63
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.339893
File:
PDF, 1.06 MB
english, 1988