Study of electrical damage in GaAs induced by SiCl4 reactive ion etching
Lootens, D., Van Daele, P., Demeester, P., Clauws, P.Volume:
70
Year:
1991
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.350314
File:
PDF, 716 KB
english, 1991