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Etching of SiO[sub 2] features in fluorocarbon plasmas: Explanation and prediction of gas-phase-composition effects on aspect ratio dependent phenomena in trenches
Kokkoris, George, Gogolides, Evangelos, Boudouvis, Andreas. G.Volume:
91
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1435833
File:
PDF, 567 KB
english, 2002