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Low temperature nanoscopic kinetics of hydrogen plasma-enhanced crystallization of a-Si:H films
Khait, Yu. L., Weil, R., Beserman, R., Edelman, F., Beyer, W., Rech, B.Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1574598
File:
PDF, 511 KB
english, 2003