Structural and electrical quality of the high-k dielectric...

Journal of Applied Physics 2002 Vol. 92; Iss. 1

Structural and electrical quality of the high-k dielectric Y[sub 2]O[sub 3] on Si (001): Dependence on growth parameters

Dimoulas, A., Vellianitis, G., Travlos, A., Ioannou-Sougleridis, V., Nassiopoulou, A. G.
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Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1483379
File:
PDF, 743 KB
english, 2002
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