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Nondestructive determination of damage depth profiles in ion-implanted semiconductors by spectroscopic ellipsometry using different optical models
Fried, M., Lohner, T., Aarnink, W. A. M., Hanekamp, L. J., van Silfhout, A.Volume:
71
Year:
1992
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.351014
File:
PDF, 1.12 MB
english, 1992