Nanometer-scale Si selective epitaxial growth on Si surface windows in ultrathin oxide films fabricated using scanning tunneling microscopy
Shibata, Motoshi, Nitta, Yoshiki, Fujita, Ken, Ichikawa, MasakazuVolume:
73
Year:
1998
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.122415
File:
PDF, 864 KB
english, 1998