Cavity ring down study of the densities and kinetics of Si...

Journal of Applied Physics 2001 Vol. 89; Iss. 4

Cavity ring down study of the densities and kinetics of Si and SiH in a remote Ar-H[sub 2]-SiH[sub 4] plasma

Kessels, W. M. M., Hoefnagels, J. P. M., Boogaarts, M. G. H., Schram, D. C., van de Sanden, M. C. M.
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Volume:
89
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1344911
File:
PDF, 432 KB
english, 2001
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