Etch characteristics of (Pb,Sr)TiO[sub 3] thin films using CF[sub 4]/Ar inductively coupled plasma
Kim, Gwan-Ha, Kim, Kyoung-Tae, Kim, Dong-Pyo, Kim, Chang-IlVolume:
21
Year:
2003
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1593049
File:
PDF, 441 KB
english, 2003