Transient plasma-induced emission analysis of laser-desorbed species during Cl[sub 2] plasma etching of Si
Choe, Jae Young, Fuller, N. C. M., Donnelly, Vincent M., Herman, Irving P.Volume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1290375
File:
PDF, 435 KB
english, 2000