![](/img/cover-not-exists.png)
[IEEE 2009 International Semiconductor Device Research Symposium (ISDRS 2009) - College Park, MD (2009.12.9-2009.12.11)] 2009 International Semiconductor Device Research Symposium - Plasma doping and spike annealing technique for steep SDE formation in nano-scale MOSFET
Miyata, T., Oshima, Y., Hokazono, A., Adachi, K., Miyano, K., Tsujii, H., Kawanaka, S., Inaba, S., Itani, T., Iinuma, T., Toyoshima, Y.Year:
2009
Language:
english
DOI:
10.1109/isdrs.2009.5378311
File:
PDF, 771 KB
english, 2009