[IEEE 2009 International Semiconductor Device Research...

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[IEEE 2009 International Semiconductor Device Research Symposium (ISDRS 2009) - College Park, MD (2009.12.9-2009.12.11)] 2009 International Semiconductor Device Research Symposium - Plasma doping and spike annealing technique for steep SDE formation in nano-scale MOSFET

Miyata, T., Oshima, Y., Hokazono, A., Adachi, K., Miyano, K., Tsujii, H., Kawanaka, S., Inaba, S., Itani, T., Iinuma, T., Toyoshima, Y.
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Year:
2009
Language:
english
DOI:
10.1109/isdrs.2009.5378311
File:
PDF, 771 KB
english, 2009
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