Deposition-rate reduction through improper...

Deposition-rate reduction through improper substrate-to-electrode attachment in very-high-frequency deposition of a-Si:H

Meiling, H., van Sark, W. G. J. H. M., Bezemer, J., van der Weg, W. F.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
80
Year:
1996
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.363227
File:
PDF, 379 KB
english, 1996
Conversion to is in progress
Conversion to is failed