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Deposition-rate reduction through improper substrate-to-electrode attachment in very-high-frequency deposition of a-Si:H
Meiling, H., van Sark, W. G. J. H. M., Bezemer, J., van der Weg, W. F.Volume:
80
Year:
1996
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.363227
File:
PDF, 379 KB
english, 1996