Residual stress in low pressure chemical vapor deposition...

Residual stress in low pressure chemical vapor deposition SiN[sub x] films deposited from silane and ammonia

Temple-Boyer, P.
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Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581302
Date:
July, 1998
File:
PDF, 379 KB
english, 1998
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