Residual stress in low pressure chemical vapor deposition SiN[sub x] films deposited from silane and ammonia
Temple-Boyer, P.Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581302
Date:
July, 1998
File:
PDF, 379 KB
english, 1998