Controlling line-edge roughness and reactive ion etch lag...

Journal of Applied Physics 2007 Vol. 101; Iss. 7

Controlling line-edge roughness and reactive ion etch lag in sub-150 nm features in borophosphosilicate glass

Bhatnagar, Parijat, Panda, Siddhartha, Edleman, Nikki L., Allen, Scott D., Wise, Richard, Mahorowala, Arpan
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Volume:
101
Year:
2007
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2717141
File:
PDF, 480 KB
english, 2007
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