On a dual inductively coupled plasma for direct and remote...

Physics of Plasmas 2004 Vol. 11; Iss. 10

On a dual inductively coupled plasma for direct and remote plasma in a reactor

Uhm, Saehoon, Lee, Kyong-Ho, Chang, Hong Young, Chung, Chin Wook
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Volume:
11
Year:
2004
Language:
english
Journal:
Physics of Plasmas
DOI:
10.1063/1.1789997
File:
PDF, 480 KB
english, 2004
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