Electron-beam-induced pattern etching of AlGaAs using an ultrathin GaAs oxide as a resist
Taneya, M., Sugimoto, Y., Hidaka, H., Akita, K.Volume:
68
Year:
1990
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.346325
File:
PDF, 725 KB
english, 1990