Effects of Hf contamination on the properties of silicon oxide metal–oxide–semiconductor devices
Kang, Chang Seok, Onishi, Katsunori, Kang, Laegu, Lee, Jack C.Volume:
81
Year:
2002
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.1532755
File:
PDF, 297 KB
english, 2002