Stress reduction in sputter deposited films using nanostructured compliant layers by high working-gas pressures
Karabacak, Tansel, Senkevich, Jay. J., Wang, Gwo-Ching, Lu, Toh-MingVolume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1861940
File:
PDF, 634 KB
english, 2005