Positron study of plasma-enhanced chemical vapor deposited...

Journal of Applied Physics 1995 Vol. 78; Iss. 4

Positron study of plasma-enhanced chemical vapor deposited silicon nitride films

Landheer, D., Aers, G. C., Sproule, G. I., Khatri, R., Simpson, P. J., Gujrathi, S. C.
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Volume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360115
File:
PDF, 1.04 MB
english, 1995
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