Effectiveness of AlN encapsulant in annealing ion-implanted...

Journal of Applied Physics 1999 Vol. 86; Iss. 2

Effectiveness of AlN encapsulant in annealing ion-implanted SiC

Handy, Evan M., Rao, Mulpuri V., Jones, K. A., Derenge, M. A., Chi, P. H., Vispute, R. D., Venkatesan, T., Papanicolaou, N. A., Mittereder, J.
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Volume:
86
Year:
1999
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.370798
File:
PDF, 475 KB
english, 1999
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