![](/img/cover-not-exists.png)
Direct-current hollow-cathode glow-discharge plasma-enhanced-chemical-vapour-deposition technique for a-Si:H thin-film production
Matsumura, S., Sakurai, K., Berezin, A. A., Hobson, R. M., Teii, S., Chang, Jen-ShihVolume:
63
Language:
english
Journal:
Canadian Journal of Physics
DOI:
10.1139/p85-133
Date:
June, 1985
File:
PDF, 272 KB
english, 1985