Hydrogen release kinetics during reactive magnetron sputter...

Journal of Applied Physics 1994 Vol. 76; Iss. 3

Hydrogen release kinetics during reactive magnetron sputter deposition of a-Si:H: An isotope labeling study

Abelson, J. R., Mandrell, L., Doyle, J. R.
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Volume:
76
Year:
1994
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.357706
File:
PDF, 2.16 MB
english, 1994
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