Mechanisms of sputtering of Si in a Cl2 environment by ions...

Journal of Applied Physics 1988 Vol. 64; Iss. 1

Mechanisms of sputtering of Si in a Cl2 environment by ions with energies down to 75 eV

Oostra, D. J., Haring, A., van Ingen, R. P., de Vries, A. E.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
64
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.341429
File:
PDF, 1.23 MB
english, 1988
Conversion to is in progress
Conversion to is failed