Impact of exposure induced refractive index changes of...

Impact of exposure induced refractive index changes of photoresists on the photolithographic process

Erdmann, Andreas, Henderson, Clifford L., Willson, C. Grant
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Volume:
89
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1359165
File:
PDF, 551 KB
english, 2001
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