Averaging effect of radical particle profile by the...

Materials Science and Engineering: A 1991 Vol. 140; Iss. none

Averaging effect of radical particle profile by the scanning plasma method in SiH4Ar plasmas

Hiroshi Fujiyama, Hiroharu Kawasaki, Yoshinobu Matsuda, Noriyasu Ohno
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Volume:
140
Year:
1991
Language:
english
Pages:
7
DOI:
10.1016/0921-5093(91)90480-b
File:
PDF, 554 KB
english, 1991
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