Correlation between the dielectric constant and porosity of nanoporous silica thin films deposited by the gas evaporation technique
Si, J. J., Ono, H., Uchida, K., Nozaki, S., Morisaki, H., Itoh, N.Volume:
79
Year:
2001
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.1415042
File:
PDF, 290 KB
english, 2001