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Structure and properties of TiCx layers prepared by plasma-assisted chemical vapour deposition methods
Ch. Täschner, A. Leonhardt, M. Schönherr, E. Wolf, J. HenkeVolume:
139
Year:
1991
Language:
english
Pages:
4
DOI:
10.1016/0921-5093(91)90598-h
File:
PDF, 433 KB
english, 1991