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Patterning of fluorine-, hydrogen-, and carbon-containing SiO[sub 2]-like low dielectric constant materials in high-density fluorocarbon plasmas: Comparison with SiO[sub 2]
Standaert, T. E. F. M., Matsuo, P. J., Allen, S. D., Oehrlein, G. S., Dalton, T. J.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581643
File:
PDF, 512 KB
english, 1999