![](/img/cover-not-exists.png)
Simulation of SiO[sub 2] and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface etching, local flux calculation, and profile evolution
Kokkoris, G., Tserepi, A., Boudouvis, A. G., Gogolides, E.Volume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1738660
File:
PDF, 814 KB
english, 2004