Stability of 180° domain in ferroelectric thin films

Journal of Applied Physics 2003 Vol. 94; Iss. 1

Stability of 180° domain in ferroelectric thin films

Wang, Biao, Woo, C. H.
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Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1578529
File:
PDF, 467 KB
english, 2003
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