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Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements
Curley, G. A., Gatilova, L., Guilet, S., Bouchoule, S., Gogna, G. S., Sirse, N., Karkari, S., Booth, J. P.Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3330766
File:
PDF, 1.25 MB
english, 2010