Plasma nitriding of sputtered Ti films

Materials Science and Engineering: A 1993 Vol. 163; Iss. 2

Plasma nitriding of sputtered Ti films

J. Musil, J. Vlček, V. Ježek, M. Kubásek, R. Čerstvý, T. Tölg, M. Benda, M. Kolega, J. Musil Jr.
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Volume:
163
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0921-5093(93)90786-e
File:
PDF, 799 KB
english, 1993
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